| 摘要 |
<p>An apparatus is described for treatment of substrates, which has a housing which forms a process chamber in the interior. The apparatus has at least one aperture opening in the housing, at least one sealing arrangement in the area of the aperture opening, in order to seal the process chamber from the environment, and at least one gas inlet adjacent to the at least one sealing arrangement. The gas inlet is arranged such that gas emerging therefrom forms a gas barrier layer between the seal and a gas in the process chamber, in particular reactive gas species. Furthermore, an apparatus is provided for treatment of substrates having a housing which forms a process chamber in the interior, wherein the housing is formed from at least two, and preferably three, side-wall parts which radially surround the process chamber. At least one radially circumferential sealing arrangement is provided between the end faces of the side-wall parts and at least one gas guide is provided between the at least one circumferential sealing arrangement and the process chamber, which gas guide is suitable for forming a gas barrier layer between the sealing arrangement and the process chamber.</p> |
