| 摘要 |
A method of densifying a porous substrate comprising in a reaction chamber, submerging the porous substrate in a liquid precursor so that the liquid precursor infiltrates pores in the porous substrate and partially densifying the submerged porous substrate by inductively heating the porous substrate to a temperature sufficient to cause liquid precursor to pyrolize and deposit a decomposition product within the pores of the substrate, after partially densifying the porous substrate, lowering the level of the liquid precursor in the reaction chamber so leave the partially densified porous substrate outside of the liquid precursor, heating the remaining liquid precursor to a temperature at which is vaporizes, and finishing the densification of the partially densified porous substrate by using the vaporized liquid precursor in a CVD densification process.
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