发明名称 NOVEL TUNGSTEN AMINOAMIDE AZIDE COMPOUNDS, PREPARATION METHOD THEREOF AND PROCESS FOR THE FORMATION OF THIN FILMS USING THE SAME
摘要 PURPOSE: A novel tungsten aminoamide azide compound is thermally stable and highly volatile, so that the novel tungsten aminoamide azide compound can be used in producing a thin film including quality tungsten. CONSTITUTION: A novel tungsten aminoamide azide compound is indicated as the chemical formula 1. A preparation method of the novel tungsten aminoamide azide compound indicated as the chemical formula 1 comprises a step of generating the reaction of a compound represented by the chemical formula 2 and a compound represented by the chemical formula 3. A method for growing a thin film containing tungsten by using the novel tungsten aminoamide azide compound is provided. The film growth process is performed by the chemical vapor deposition (CVD) method or the atomic layer deposition (ALD) method.
申请公布号 KR101306813(B1) 申请公布日期 2013.09.10
申请号 KR20120049235 申请日期 2012.05.09
申请人 KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY 发明人 PARK, BO KEUN;KIM, CHANG GYOUN;CHUNG, TAEK MO;LEE, YOUNG KUK;LIM, JONG SUN;JEONG, SEOG JONG;YEO, SO JUNG
分类号 C07F11/00;C23C16/18;C23C16/44 主分类号 C07F11/00
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