| 摘要 |
The present invention provides an exposure apparatus including a light shielding plate which is placed on a plane conjugate to an object plane of a projection optical system in an illumination optical system, includes, on an edge thereof, an arc that overlaps a circular boundary line inside an outer periphery of a substrate, and defines a region on the substrate, to which a pattern is to be transferred, a detection unit which detects a shift amount between the center position of the substrate and the center position of an array of a plurality of shot regions on a layer, and a control unit which positions the plate at a position, at which the plate shields light incident on an outer peripheral region shifted inward from the outer periphery of the substrate by a predetermined width, based on the shift amount.
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