发明名称 |
Method and system for stencil design for particle beam writing |
摘要 |
Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
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申请公布号 |
US8533640(B2) |
申请公布日期 |
2013.09.10 |
申请号 |
US201213607708 |
申请日期 |
2012.09.08 |
申请人 |
LAPANIK DMITRI;MATSUSHITA SHOHEI;MITSUHASHI TAKASHI;WU ZHIGANG;D2S, INC. |
发明人 |
LAPANIK DMITRI;MATSUSHITA SHOHEI;MITSUHASHI TAKASHI;WU ZHIGANG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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