发明名称 Colloidal silica containing silica secondary particles having bent structure and/or branched structure, and method for producing same
摘要 This invention provides a dense, high-purity colloidal silica containing silica secondary particles having a branched and/or bent structure, and a production method thereof. Specifically, this invention provides a method for producing a colloidal silica, comprising the steps of 1) preparing a mother liquid containing an alkali catalyst and water, and having a pH of 9 to 12; and 2) adding a hydrolysis liquid obtained by hydrolysis of an alkyl silicate to the mother liquid, wherein the step of adding the hydrolysis liquid to the mother liquid sequentially comprises A) step 1 of adding the hydrolysis liquid until the pH of the resulting liquid mixture becomes less than 7; B) step 2 of adding an aqueous alkali solution until the pH of the liquid mixture becomes 7 or more; and C) step 3 of adding the hydrolysis liquid while maintaining the pH of the liquid mixture at 7 or more, and a colloidal silica containing silica secondary particles having a branched and/or bent structure, obtained by this method.
申请公布号 US8529787(B2) 申请公布日期 2013.09.10
申请号 US20090998096 申请日期 2009.09.01
申请人 HIGUCHI KAZUAKI;OTSUKI HIDEKI;FUSO CHEMICAL CO., LTD. 发明人 HIGUCHI KAZUAKI;OTSUKI HIDEKI
分类号 C09K13/00 主分类号 C09K13/00
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