发明名称 Manufacturing method of metal oxide semiconductor material for gas sensor
摘要 Provided is a manufacturing method of a metal oxide semiconductor material for gas sensors by which an oxide precursor and noble metal colloid particles will not readily cohere in the manufacturing process. The manufacturing process implements a precursor solution synthesis step 1 of synthesizing an oxide precursor solution in which an oxide precursor is dispersed, a pH adjustment step 3 of adjusting the pH of the oxide precursor solution, a precursor-colloid dispersion preparation step 5 of preparing an oxide precursor-noble metal colloid dispersion in which the oxide precursor and the noble metal colloid are dispersed substantially uniformly, a purifying step 7 of purifying the oxide precursor-noble metal colloid dispersion to obtain a purified oxide precursor noble metal colloid dispersion, and a freeze-drying step 11 of freeze-drying an precipitate of the purified oxide precursor-noble metal colloid dispersion.
申请公布号 US8529799(B2) 申请公布日期 2013.09.10
申请号 US200913060886 申请日期 2009.08.28
申请人 IMAMURA TETSUJI;KUWAHARA DAISUKE;NAKANO TAKAYUKI;ISHIBASHI TAKAHIRO;HOKURIKU ELECTRIC INDUSTRY CO., LTD. 发明人 IMAMURA TETSUJI;KUWAHARA DAISUKE;NAKANO TAKAYUKI;ISHIBASHI TAKAHIRO
分类号 H01B1/02;H01B1/22 主分类号 H01B1/02
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