发明名称 Salt and photoresist composition comprising the same
摘要 The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more -CH2- can be replaced by -O- or -CO-, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.
申请公布号 US8530138(B2) 申请公布日期 2013.09.10
申请号 US201113216776 申请日期 2011.08.24
申请人 YOSHIDA ISAO;ICHIKAWA KOJI;SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 YOSHIDA ISAO;ICHIKAWA KOJI
分类号 G03F7/00;C07C309/00;C07D343/00;C07D411/00;G03F7/028 主分类号 G03F7/00
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