发明名称 |
Systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia |
摘要 |
Systems and methods for processing a substrate include supplying steam in a chamber, arranging a substrate with a deposited layer that includes silicon in the chamber, and directing UV light onto the deposited layer in the presence of the steam for a predetermined conversion period to at least partially convert the deposited layer. Systems and methods for densifying a deposited layer of a substrate include supplying ammonia in a chamber, arranging the substrate that includes the deposited layer in the chamber, and directing UV light onto the deposited layer in the presence of the ammonia for a predetermined conversion period to at least partially densify the deposited layer.
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申请公布号 |
US8528224(B2) |
申请公布日期 |
2013.09.10 |
申请号 |
US20100854421 |
申请日期 |
2010.08.11 |
申请人 |
VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART;NOVELLUS SYSTEMS, INC. |
发明人 |
VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART |
分类号 |
F26B3/34 |
主分类号 |
F26B3/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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