发明名称 Systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia
摘要 Systems and methods for processing a substrate include supplying steam in a chamber, arranging a substrate with a deposited layer that includes silicon in the chamber, and directing UV light onto the deposited layer in the presence of the steam for a predetermined conversion period to at least partially convert the deposited layer. Systems and methods for densifying a deposited layer of a substrate include supplying ammonia in a chamber, arranging the substrate that includes the deposited layer in the chamber, and directing UV light onto the deposited layer in the presence of the ammonia for a predetermined conversion period to at least partially densify the deposited layer.
申请公布号 US8528224(B2) 申请公布日期 2013.09.10
申请号 US20100854421 申请日期 2010.08.11
申请人 VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART;NOVELLUS SYSTEMS, INC. 发明人 VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART
分类号 F26B3/34 主分类号 F26B3/34
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