发明名称 Nanodot charge storage structures and methods
摘要 Methods, devices, and systems associated with charge storage structures in semiconductor devices are described herein. In one or more embodiments, a method of forming nanodots includes forming at least a portion of a charge storage structure over a material by reacting a single-source precursor and a reactant, where the single-source precursor includes a metal and a semiconductor.
申请公布号 US8530305(B2) 申请公布日期 2013.09.10
申请号 US20100762712 申请日期 2010.04.19
申请人 GOSWAMI JAYDEB;MICRON TECHNOLOGY, INC. 发明人 GOSWAMI JAYDEB
分类号 H01L21/02 主分类号 H01L21/02
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