| 摘要 |
FIELD: chemistry.SUBSTANCE: invention can be used in chemical industry. The method of producing high-quality quartz grit involves crushing starting material, decrepitation followed by crushing and grinding the material, magnetic separation, drying the non-magnetic fraction, chemical treatment and washing. Chemical treatment is carried out first with an alkaline solution with concentration of 40-200 g/l at temperature of 80-105°C for at least two hours, followed by washing with water and hypersonic attritioning. The precipitate is then treated with inorganic acid or a mixture of inorganic acids in 2-3 steps with intermediate washing and ultrasonic attritioning, followed by washing with water and drying.EFFECT: invention provides virtually complete removal of all impurities from quartz material and enables to obtain an especially pure quartz product with impurity content of not more than 1×10wt %.5 cl, 1 tbl |
