发明名称 Curable composition for imprints, patterning method and pattern
摘要 A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.
申请公布号 US8530540(B2) 申请公布日期 2013.09.10
申请号 US20090498403 申请日期 2009.07.07
申请人 KODAMA KUNIHIKO;FUJIFILM CORPORATION 发明人 KODAMA KUNIHIKO
分类号 C08F20/22 主分类号 C08F20/22
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