发明名称 |
Extreme ultraviolet light source apparatus |
摘要 |
An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
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申请公布号 |
US8530869(B2) |
申请公布日期 |
2013.09.10 |
申请号 |
US201113184047 |
申请日期 |
2011.07.15 |
申请人 |
NAGAI SHINJI;ISHIHARA TAKANOBU;KAKIZAKI KOUJI;SOBUKAWA HIROSHI;MURAKAMI TAKESHI;INOUE MASAHIRO;GIGAPHOTON INC.;EBARA CORPORATION;KABUSHIKI KAISHA TOPCON |
发明人 |
NAGAI SHINJI;ISHIHARA TAKANOBU;KAKIZAKI KOUJI;SOBUKAWA HIROSHI;MURAKAMI TAKESHI;INOUE MASAHIRO |
分类号 |
A61N5/06;G01J3/10;G01N21/64 |
主分类号 |
A61N5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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