发明名称 DISTRIBUTED BRAGG REFLECTOR AND PROCESS OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To solve the problem in which, since conventional distributed Bragg reflectors having an air layer use a method in which the sacrificial layer is removed after a sacrificial layer and a high refractive index layer are grown, there are so many processes including crystal growth, patterning, dry etching, and wet etching.SOLUTION: In the distributed Bragg reflector formed by alternately laminating a material layer having refractive index higher than that of air and an air layer, the material layer having refractive index higher than that of air is composed of an upper end face roughly parallel to a substrate and a side face that continues from the upper end face. The distributed Bragg reflector is manufactured by a heat treatment in a growth process.
申请公布号 JP2013179155(A) 申请公布日期 2013.09.09
申请号 JP20120041845 申请日期 2012.02.28
申请人 NAGOYA UNIV 发明人 MITSUNARI TADASHI;TANIGAWA TOMOYUKI;HONDA YOSHIO;YAMAGUCHI MASAFUMI;AMANO HIROSHI
分类号 H01S5/187;H01L33/10 主分类号 H01S5/187
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