发明名称 |
METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL, AND GROUP III NITRIDE SEMICRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of producing an excellent group III nitride crystal having reduced impurities, suitable especially for electronic device application or the like, and having few vacancy type defects.SOLUTION: In a method for producing a group III nitride crystal by introducing group III raw material gas G3 and group V raw material gas G4 into a crystal growth furnace 100 from a raw material gas introduction port and growing a group III nitride crystal, an impurity filter is provided at least on a part of the raw material gas introduction port. The impurity filter is one of linear, lattis-shaped, striped or porous ones. |
申请公布号 |
JP2013177275(A) |
申请公布日期 |
2013.09.09 |
申请号 |
JP20120042190 |
申请日期 |
2012.02.28 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
KIYOMI KAZUMASA;IKEDA HIROTAKA;FUJITO TAKESHI |
分类号 |
C30B29/38;C30B25/14;H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|