发明名称 METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL, AND GROUP III NITRIDE SEMICRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method capable of producing an excellent group III nitride crystal having reduced impurities, suitable especially for electronic device application or the like, and having few vacancy type defects.SOLUTION: In a method for producing a group III nitride crystal by introducing group III raw material gas G3 and group V raw material gas G4 into a crystal growth furnace 100 from a raw material gas introduction port and growing a group III nitride crystal, an impurity filter is provided at least on a part of the raw material gas introduction port. The impurity filter is one of linear, lattis-shaped, striped or porous ones.
申请公布号 JP2013177275(A) 申请公布日期 2013.09.09
申请号 JP20120042190 申请日期 2012.02.28
申请人 MITSUBISHI CHEMICALS CORP 发明人 KIYOMI KAZUMASA;IKEDA HIROTAKA;FUJITO TAKESHI
分类号 C30B29/38;C30B25/14;H01L21/205 主分类号 C30B29/38
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