发明名称 |
METHOD FOR CLEANING INDUCTION HEATING COIL OF APPARATUS FOR PRODUCING SINGLE CRYSTAL BY FZ METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning an induction heating coil, which can prevent an increase in the dislocation-developing probability in single crystal production by efficiently removing substances deposited on the inner surface and lowering the cooling efficiency of the induction heating coil.SOLUTION: There is provided a method for cleaning an induction heating coil 7 acting as a heat source for forming a melt zone 10 in an apparatus 14 for producing a single crystal by an FZ method in which the melt zone 10 is moved from the lower part to the upper part of a raw material crystal rod 1 to grow a single crystal rod 2 below the melt zone 10, which method for cleaning the induction heating coil 7 of the apparatus 14 for producing the single crystal by the FZ method comprises cleaning only the cooling water passage of the induction heating coil 7 by allowing a cleaning solution to flow into the cooling water passage through which the cooling water inside the induction heating coil 7 is passed. |
申请公布号 |
JP2013177254(A) |
申请公布日期 |
2013.09.09 |
申请号 |
JP20120040883 |
申请日期 |
2012.02.28 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
WATANABE KAZUNORI;KOIKE TAKASHI;SATO KENICHI;NAKAZAWA KEIICHI |
分类号 |
C30B13/20;H05B6/36 |
主分类号 |
C30B13/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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