| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive negative resin composition capable of producing a fine structure (for example, a nozzle) excellent in pigment ink resistance with high sensitivity and high resolution when a photolithographic process is applied, a fine structure using the resin composition, a method for producing the fine structure and a liquid ejection head.SOLUTION: There are provided a photosensitive negative resin composition which contains: a resin (a) having at least three cyclohexene oxide skeletons in its molecule, an onium salt (b) composed of a cationic part structure represented by the formula b1 defined in the description and an anionic part structure represented by the formula b2 defined in the description, a silane compound (c) and an organic solvent (d), a fine structure using the resin composition, a method for producing the fine structure and a liquid ejection head. |
