METHOD FOR MANUFACTURING GRAPHENE STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a graphene structure having a graphene film of a desired film thickness.SOLUTION: A graphene layer 5 is formed by successively layering an insulating film layer 3 containing at least silicon, and a catalyst metal layer 4 on a predetermined substrate 2, and supplying carbon in a plasma state onto the resultant substrate by using the arc plasma discharge which is pulse-controlled under high degree of vacuum and high temperature.