发明名称 |
METHOD OF PRODUCING GaN-BASED FILM AND COMPOSITE SUBSTRATE USED THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a GaN-based film capable of efficiently obtaining a GaN film having a large main surface area, less warpage, and good crystallinity, and to provide a composite substrate used therefor.SOLUTION: A method of producing a GaN-based film includes the steps of: preparing a composite substrate 10 including a support substrate 11 dissoluble in an etching solution and a single crystal film 13 arranged on a side of a main surface 11m of the support substrate 11, wherein a coefficient of thermal expansion in the main surface 11m of the support substrate 11 is more than 0.8 time and less than 1.2 times compared with a coefficient of thermal expansion of GaN crystal; depositing a GaN-based film 20 on a main surface 13m of the single crystal film 13 arranged on the side of the main surface 11m of the support substrate 11; and removing the support substrate 11 by dissolving the support substrate 11 in the etching solution. |
申请公布号 |
JP2013177285(A) |
申请公布日期 |
2013.09.09 |
申请号 |
JP20120185411 |
申请日期 |
2012.08.24 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
SATO KAZUNARI;SEKI YUKI;UEMATSU KOJI;YAMAMOTO YOSHIYUKI;MATSUBARA HIDEKI;FUJIWARA SHINSUKE;YOSHIMURA MASASHI |
分类号 |
C30B25/20;C23C16/34;C30B29/38;H01L21/205 |
主分类号 |
C30B25/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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