发明名称 METHOD OF PRODUCING GaN-BASED FILM AND COMPOSITE SUBSTRATE USED THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a GaN-based film capable of efficiently obtaining a GaN film having a large main surface area, less warpage, and good crystallinity, and to provide a composite substrate used therefor.SOLUTION: A method of producing a GaN-based film includes the steps of: preparing a composite substrate 10 including a support substrate 11 dissoluble in an etching solution and a single crystal film 13 arranged on a side of a main surface 11m of the support substrate 11, wherein a coefficient of thermal expansion in the main surface 11m of the support substrate 11 is more than 0.8 time and less than 1.2 times compared with a coefficient of thermal expansion of GaN crystal; depositing a GaN-based film 20 on a main surface 13m of the single crystal film 13 arranged on the side of the main surface 11m of the support substrate 11; and removing the support substrate 11 by dissolving the support substrate 11 in the etching solution.
申请公布号 JP2013177285(A) 申请公布日期 2013.09.09
申请号 JP20120185411 申请日期 2012.08.24
申请人 SUMITOMO ELECTRIC IND LTD 发明人 SATO KAZUNARI;SEKI YUKI;UEMATSU KOJI;YAMAMOTO YOSHIYUKI;MATSUBARA HIDEKI;FUJIWARA SHINSUKE;YOSHIMURA MASASHI
分类号 C30B25/20;C23C16/34;C30B29/38;H01L21/205 主分类号 C30B25/20
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