发明名称 HOLLOW STRUCTURE AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a hollow structure using a photosensitive resin composition.SOLUTION: The method for producing a hollow structure includes steps of: forming a photosensitive resin composition layer on a substrate by using a first photosensitive resin composition; irradiating a predetermined part of the photosensitive resin composition layer with actinic rays to cure the exposed part with light; forming a pattern by removing a part except for the exposed part of the photosensitive resin composition layer; thermally curing the exposed part of the photosensitive resin composition layer to form a rib part comprising the resin cured product; and forming a hollow structure by sticking a second photosensitive resin composition prepared into a film to an upper part of the rib part.
申请公布号 JP2013178526(A) 申请公布日期 2013.09.09
申请号 JP20130076083 申请日期 2013.04.01
申请人 HITACHI CHEMICAL CO LTD 发明人
分类号 G03F7/40;C08J5/12;H03H3/08;H03H9/25 主分类号 G03F7/40
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