| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and the like for processing a substrate such that drying preventing liquid entering a pattern on the substrate can be removed.SOLUTION: A substrate W, which has a surface with an irregular pattern formed thereon, and to which drying preventing liquid covering the pattern so as to enter recessed parts thereof adheres, is carried into a processing container 31; the substrate W is heated while pressurizing the interior of the processing container 31 so that the temperature-pressure state of the drying preventing liquid on the substrate W changes along the vapor pressure curve of the drying preventing liquid or through a region lying on the liquid phase side of the vapor pressure curve, and reaches a high-pressure state which is a supercritical state or a subcritical state, thereby bringing the drying preventing liquid into the high-pressure state while keeping the liquid in the recessed portions of the pattern; and thereafter, fluid in the processing container 31 is discharged in a high pressure state or in a gaseous state. |
