发明名称 COATING METHOD, COATING APPARATUS, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
摘要 PROBLEM TO BE SOLVED: To provide a coating method capable of accurately managing a liquid level with excellent reproducibility in coating start of each time, improving uniformity of coating film thickness between substrates, efficiently removing floating foreign matter brought into a liquid tank, and remarkably reducing coating defect due to the foreign matter.SOLUTION: In a coating method for bringing a coating liquid passing through a nozzle from the liquid tank to reach an opening of a nozzle edge into contact with a coated face of the substrate so as to form a coating film, the liquid tank has an overflow plate of a prescribed height for regulating a desired liquid level in the coating start. After one time coating completion, the coating liquid is supplied to the liquid tank, and a liquid surface is lifted up to a liquid level exceeding the desired liquid level in the coating start once. Prior to the next coating, the coating liquid stored up to the liquid level exceeding the desired liquid level in the coating start of the liquid tank is overflowed from an upper end of the overflow plate so as to lower the liquid surface down to the desired liquid level in the coating start.
申请公布号 JP2013176757(A) 申请公布日期 2013.09.09
申请号 JP20130052830 申请日期 2013.03.15
申请人 HOYA CORP 发明人
分类号 B05D1/26;B05C11/10;B05C11/105;B05D3/00;G03F1/50;G03F7/16;G03F7/20;H01L21/027 主分类号 B05D1/26
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