| 发明名称 |
SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A source collector apparatus includes a plasma generation apparatus arranged to excite a fuel to form a radiation emitting plasma, a collector arranged to collect the radiation, and a contamination receiving apparatus, wherein the contamination receiving apparatus is provided with a porous structure. |
| 申请公布号 |
WO2013127587(A2) |
申请公布日期 |
2013.09.06 |
| 申请号 |
WO2013EP51657 |
申请日期 |
2013.01.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE, VADIM;FRANKEN, JOHANNES;KEMPEN, ANTONIUS;VAN KAMPEN, MAARTEN;MESTROM, WILBERT |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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