RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND

摘要

The present invention is a radiation-sensitive resin composition containing a radiation-sensitive acid-generating body and a polymer having structural units which include a bis-lactone structure. The bis-lactone structure is preferably one represented by formula (a). In formula (a), R2-R6 are each independently a hydrogen atom or a C1-C10 monovalent hydrocarbon group. The structural units are preferably units represented by formula (1). In formula (1), R1 represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group, and Y represents a single bond or a divalent linking group.