| 摘要 |
An exposure mask provided with a semi-transparent film, capable of forming a resist in which a convex portion is not formed in an end portion and the end portion has gentle shape. In an exposure mask having a first region and a second region having different phase and transmittance with respect to exposure light, the phase difference Deltatheta with respect to exposure light which transmits though the first region and the second region and the transmittance n of the second region with respect to exposure light are defined so as to satisfy following formula 1. <?in-line-formulae description="In-line Formulae" end="lead"?>Deltatheta<=arccos(-√n/2) [Formula 1]<?in-line-formulae description="In-line Formulae" end="tail"?> Accordingly, a resist having regions with different thicknesses and having gentle shape in an edge can be formed. By performing a process such as etching with this resist, regions having different thicknesses can be formed in a self-aligned manner. |
