| 摘要 |
A first purpose of the present invention is to provide a photocatalyst film structure in which positive holes and electrons reach an outer surface, and which is capable of reacting with oxygen and reactants such as organic matter even when a visible-light-responsive semiconductor for a photocatalyst is completely coated with a dense film of material that is stable in acid or alkali, and a second purpose of the present invention is to provide an inexpensive and novel co-catalyst that is stable in acid or alkali, and that is suitable for use in the photocatalyst structure. The first purpose is achieved by a photocatalyst film structure in which: a visible-light-responsive semiconductor layer for a photocatalyst is provided on an electroconductive substrate, the semiconductor layer is completely coated with a dense film of a specific oxide that is stable in acid or alkali, transparent to visible light, and positive-hole conductive, and on the surface of which positive holes can effectively decompose organic matter and the like and increase hydrophilicity; and in which a co-catalyst layer exposed to the atmosphere and stable in acid or alkali is provided on the electroconductive substrate at a position other than that of the semiconductor layer. The second purpose is achieved by the new discovery of a copper compound selected from CuTa2O6, CuWO4, CuNb2O6, and CuAlO2 as an environment-resistant co-catalyst that is stable in acidic as well as basic conditions, for enhancing the performance of the visible-light-responsive photocatalyst. |
