| 摘要 |
<p>This device comprises: - a first inlet manifold (7) comprising a slot (15) and fed with primary gas; - a second inlet manifold (6) supplied with secondary gas and comprising, in a region substantially adjacent to the slot of the first manifold, evenly distributed openings (11); and gas discharge means (8) situated facing the slot and the openings of said manifolds. The manifolds (6, 7) have directrix lines which are parallel or coincident each consisting of a closed planar curved line. Application notably to the handling of radioactive products, to the manufacture of electronic components and to surgery.</p> |
