发明名称 METHOD FOR FORMING FILM AND FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a film which forms a film in a film formation surface having a level difference by using a droplet discharge method, and which hardly generates cracks or the like in the film at a subsequent drying/firing process.SOLUTION: By using a droplet discharge device, a precursor solution containing at least metal powder or ceramic powder, an organic binder, and a solvent is discharged as a plurality of droplets in a film formation surface having a level difference, and thus a film is formed in a film formation region of the film formation surface. Cracks or the like are not easily generated in the film at a drying/firing process when the relation of &Dgr;t≤0.15h is satisfied in the case of satisfying the relation of tmin>(2/3) h, wherein h is the height of the level difference, &Dgr;t is the difference between the maximum value and the minimum value of the film thickness in the state after drying of the film, and tmin is the minimum value of the film thickness in the state after drying of the film.
申请公布号 JP2013173135(A) 申请公布日期 2013.09.05
申请号 JP20130003100 申请日期 2013.01.11
申请人 NGK INSULATORS LTD 发明人 FUJI YUSUKE;YOSHIOKA KUNIHIKO
分类号 B05D3/00;B05D1/26 主分类号 B05D3/00
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