发明名称 POLYCRYSTALLINE SILICON AND POLYCRYSTALLINE SILICON MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technique that prevents popcorn from being generated on a polycrystalline silicon surface and prevents a powder caused by thermal decomposition of reaction gas from being generated in spite of high-speed precipitation reaction.SOLUTION: Six gas nozzles 9 are arranged at six-time symmetrical positions on a virtual circle S having its center in the center of a bottom plate 5. Four gas nozzles 9v among them are perpendicular jet nozzles such that the direction of a center vector of gas ejection is perpendicular to the bottom plate 5 and two gas nozzles 9c are oblique jet nozzles such that the center vector of gas ejection has a component in a tangential direction of the virtual circle S. Reaction gas supplied from an oblique jet nozzle 9c creates a state in which the component imparts circling force to circulation of reaction gas in a chamber 1 in the tangential direction of the virtual circle S, and the reaction gas circulates wholly in the chamber 1 while circling. Then the circling component makes a mixing state of the reaction gas better.
申请公布号 JP2013173644(A) 申请公布日期 2013.09.05
申请号 JP20120038776 申请日期 2012.02.24
申请人 SHIN-ETSU CHEMICAL CO LTD 发明人 KUROSAWA YASUSHI;NEZU SHIGEYOSHI
分类号 C01B33/035 主分类号 C01B33/035
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