发明名称 |
POLYCRYSTALLINE SILICON AND POLYCRYSTALLINE SILICON MANUFACTURING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a technique that prevents popcorn from being generated on a polycrystalline silicon surface and prevents a powder caused by thermal decomposition of reaction gas from being generated in spite of high-speed precipitation reaction.SOLUTION: Six gas nozzles 9 are arranged at six-time symmetrical positions on a virtual circle S having its center in the center of a bottom plate 5. Four gas nozzles 9v among them are perpendicular jet nozzles such that the direction of a center vector of gas ejection is perpendicular to the bottom plate 5 and two gas nozzles 9c are oblique jet nozzles such that the center vector of gas ejection has a component in a tangential direction of the virtual circle S. Reaction gas supplied from an oblique jet nozzle 9c creates a state in which the component imparts circling force to circulation of reaction gas in a chamber 1 in the tangential direction of the virtual circle S, and the reaction gas circulates wholly in the chamber 1 while circling. Then the circling component makes a mixing state of the reaction gas better. |
申请公布号 |
JP2013173644(A) |
申请公布日期 |
2013.09.05 |
申请号 |
JP20120038776 |
申请日期 |
2012.02.24 |
申请人 |
SHIN-ETSU CHEMICAL CO LTD |
发明人 |
KUROSAWA YASUSHI;NEZU SHIGEYOSHI |
分类号 |
C01B33/035 |
主分类号 |
C01B33/035 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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