摘要 |
PROBLEM TO BE SOLVED: To provide a mixture of a cobalt compound industrially suitable for producing a cobalt-containing thin film on an object to be filmed with a simple method.SOLUTION: A mixture of bis(1-t-butylamide-2-dimethylaminobutane-N, N') cobalt, bis(2-t-butylamide-1-dimethylaminobutane-N, N') cobalt and (1-t-butylamide-2-dimethylaminobutane-N, N')(2-t-butylamide-1-dimethylaminobutane-N, N') cobalt is used and, thereby, a cobalt-containing thin film according to a CVD method can be produced. |