发明名称 SUBSTRATE FOR CVD DEPOSITION OF DIAMOND AND METHOD FOR THE PREPARATION THEREOF
摘要 A substrate for depositing diamond by CVD, comprising a base body of hard material and a coating layer that holds diamond particles as seed crystal in a matrix and is deposited joined thereto on a surface of said base body, wherein: the seed diamond particles have an average particle size of 1 mum or smaller; the matrix comprises a first metal selected from a first group of Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W and/or a first compound between said first metal and a non-metallic substance selected from boron, carbon and nitrogen, said matrix holding the diamond particles distributed therein; and a joint zone developed as a result of a diffusion process and extending over said base body and coating layer comprises either or both atoms of said first metal and a component metal of the hard material.
申请公布号 US2013230715(A1) 申请公布日期 2013.09.05
申请号 US201013884369 申请日期 2010.11.09
申请人 LEVASHOV EVGENY A.;AZAROVA EKATERINA V.;RALCHENKO VICTOR G.;BOL'SHAKOV ANDREY;ASHKINAZI EVGENY E.;ISHIZUKA HIROSHI;HOSOMI SATORU;TOMEI DIAMOND CO., LTD.;GENERAL PHYSICS INSTITUTE OF RUSSIAN ACADEMY OF SCIENCE;NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY "MISIS" 发明人 LEVASHOV EVGENY A.;AZAROVA EKATERINA V.;RALCHENKO VICTOR G.;BOL'SHAKOV ANDREY;ASHKINAZI EVGENY E.;ISHIZUKA HIROSHI;HOSOMI SATORU
分类号 C23C4/10;C23C4/12 主分类号 C23C4/10
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