| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem wherein line edge roughness (LER) upon production of a resist pattern is not always satisfactory in a conventional resist composition.SOLUTION: A salt is represented by formula (I) [in the formula (I), Qand Qwhich are the same or different each represent a fluorine atom or a 1-6C perfluoroalkyl group. Lrepresents a 1-20C (1+m1) valent saturated hydrocarbon group, wherein a hydrogen atom contained in the saturated hydrocarbon group may be replaced with a fluorine atom or a hydroxy group, and a methylene group constituting the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. Xrepresents a halogen atom, and m1 represents 2 or 3. A plurality of Xs may be independently the same or different, and Zrepresents organic cation]. |
