发明名称 METHOD OF EVALUATING SUBSRTATE
摘要 PURPOSE: A method for evaluating a substrate is provided to discriminate a texturing region from a non-texturing region by using a simple formula. CONSTITUTION: A method for evaluating a substrate includes the following steps of: forming a plurality of protrusions by texturing the top surface of the substrate (S10); photographing the textured top surface (S20); measuring the highest height and the lowest height of the protrusions (S30); calculating reference height by using the highest height, the lowest height, and a Formula 1 (S40); and discriminating a texturing region having the protrusions higher than the reference height and a non-texturing region having the protrusions lower than the reference height (S50). Formula 1 : Hr=(Hmax-Hmin)×F+Hmin. [Reference numerals] (AA) Start; (BB) End; (S10) Step of texturing a substrate; (S20) Step of photographing the upper surface of the substrate; (S30) Step of measuring the highest height and the lowest height of the protrusions; (S40) Step of measuring the highest height and the lowest height of the protrusions; (S50) Step of calculating a texturing region and a non-texturing region
申请公布号 KR20130098783(A) 申请公布日期 2013.09.05
申请号 KR20120020579 申请日期 2012.02.28
申请人 LG SILTRON INCORPORATED 发明人 PARK, JUNG KIL;HWANG, DON HA
分类号 G01B11/24;H01L31/042 主分类号 G01B11/24
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