FINFETS AND METHOD OF FABRICATING THE SAME

摘要

PURPOSE: A FinFET and a manufacturing method thereof are provided to improve the performance of a device by reducing stress applied to external fins. CONSTITUTION: A substrate (202) includes a main surface (202s). The substrate further includes a sparse region (202a) and a dense region (202b). A plurality of first trenches (212a) are downwardly extended from the main surface of the substrate to a first height. The first trenches have first widths. A plurality of second trenches (212b) are downwardly extended from the main surface of the substrate to a second height. The second trenches have second widths that are narrower than the first widths.