| 摘要 |
PROBLEM TO BE SOLVED: To perform the vapor deposition by the side deposition.SOLUTION: In an electron beam vapor deposition apparatus, a material 12 in a crucible 14 is evaporated by applying accelerated electrons to the material to heat it, and a thin film is formed by depositing the evaporated material on a surface of a substrate 17 held in the vertical direction. An electron gun 13 for accelerating electrons to be applied at least to the material 12 in the crucible 14 to the crucible 14 at the predetermined voltage, and a magnet 16 for polarization for guiding the electron beams applied by the electron gun 13 into the crucible 14 are arranged in an inclined manner in the direction of the substrate to apply the electrons to the material 12 in the crucible 14 diagonally from the upper side. A reflecting plate 19 extending in the direction of the substrate in an inclined manner is provided in the vicinity of the crucible 14 on the side away from a substrate 17. Any deflection is not formed even on a large substrate when it is held, excellent adhesiveness of the substrate to a mask or a base plate can be maintained, and degradation of the vapor deposition accuracy can be prevented. |
