| 摘要 |
PROBLEM TO BE SOLVED: To form a high-definition thin film pattern.SOLUTION: A vapor-deposition mask 1 for forming a film by arranging a plurality of stripe-shaped thin-film patterns parallel to each other at a constant arrangement pitch on a substrate, includes: a resin film 2 that has a through opening 4 formed therein, the through openings being arranged at the same arrangement pitch as the arrangement pitch of the thin-film patterns and having the same formed dimensions as the thin-film pattern, wherein the resin film passes visible light; and a plurality of magnetic metal members 3 provided by being dispersed at a surface 2a of the film 2 or inside the film 2, in an outside part of the plurality of through openings 4. |
