Vacuum Plasma Process Chamber and Method processing substrate by using thereof

摘要

PURPOSE: A vacuum plasma process chamber and a substrate processing method using the same are provided to prevent environmental pollutants by processing a substrate with plasma in a vacuum state. CONSTITUTION: A plasma source supply unit is arranged in a process chamber(100). An open frame part(30) comprises the bottom surface of the process chamber. The plasma source supply unit is composed of a shower head(20). The shower head has a hollow planar shape. The open frame part is combined with the lower side of the process chamber.