| 摘要 |
PROBLEM TO BE SOLVED: To form a true carbon onion film capable of sufficiently exerting its original performance, i.e. low friction property.SOLUTION: A method for forming a carbon onion film comprises: exhausting air from a deposition chamber 30 until a high-vacuum state is achieved; while keeping this state, intermittently introducing a hydrocarbon gas as a raw material gas from a pulse valve 34 through a nozzle 34a into the deposition chamber 30; at the same time, intermittently emitting COlaser beam 210 from a COlaser apparatus 200 so as to irradiate a throat part of the nozzle 34a with the COlaser beam 210, thereby dissociating particles of the raw material gas into atomic states and generating a carbon atomic beam 300; and irradiating a deposition target surface of an object 400 to be treated with the carbon atomic beam 300 generated by a so-called laser detonation method, thereby forming the true carbon onion film on the deposition target surface. |
