发明名称 TRANSISTOR, METHOD OF MANUFACTURING THE TRANSISTOR, SEMICONDUCTOR UNIT, METHOD OF MANUFACTURING THE SEMICONDUCTOR UNIT, DISPLAY, AND ELECTRONIC APPARATUS
摘要 <p>PURPOSE: A transistor, a method for manufacturing the transistor, a semiconductor device, a method for manufacturing the semiconductor device, a display device, and an electronic device are provided to improve electrical characteristics by preventing an oxide semiconductor layer from being damaged in a manufacturing process. CONSTITUTION: An oxide semiconductor layer (12) and a gate electrode are formed on a substrate (11). The oxide semiconductor layer includes a channel region. The gate electrode faces the channel region. A cover layer which covers the gate electrode and the oxide semiconductor layer is formed. The infiltration of moisture from an insulation layer to the oxide semiconductor layer is suppressed by the substrate.</p>
申请公布号 KR20130098906(A) 申请公布日期 2013.09.05
申请号 KR20130016903 申请日期 2013.02.18
申请人 SONY CORPORATION 发明人 MOROSAWA NARIHIRO;TOYOTA MOTOHIRO
分类号 H01L29/786;G02F1/1368 主分类号 H01L29/786
代理机构 代理人
主权项
地址