发明名称 Semiconductor Devices and Manufacturing and Design Methods Thereof
摘要 Semiconductor devices and manufacturing and design methods thereof are disclosed. In one embodiment, a semiconductor device includes an active FinFET disposed over a workpiece comprising a first semiconductive material, the active FinFET comprising a first fin. An electrically inactive FinFET structure is disposed over the workpiece proximate the active FinFET, the electrically inactive FinFET comprising a second fin. A second semiconductive material is disposed between the first fin and the second fin.
申请公布号 US2013228866(A1) 申请公布日期 2013.09.05
申请号 US201213410207 申请日期 2012.03.01
申请人 LEE TUNG YING;GUO WEN-HUIE;CHANG CHIH-HAO;CHANG SHOU-ZEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LEE TUNG YING;GUO WEN-HUIE;CHANG CHIH-HAO;CHANG SHOU-ZEN
分类号 H01L27/088;G06F17/50;H01L21/8234 主分类号 H01L27/088
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