| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus that is capable of improving uniformity of density of plasma excited at a high frequency, such as a VHF frequency band, for a large-sized substrate.SOLUTION: A plasma processing apparatus includes: waveguide members 401 that define waveguides WG; a coaxial tube 225 that supplies electromagnetic energy into the waveguides WG from predetermined feed positions in a lengthwise direction A of the waveguides WG; and a plurality of electrodes 461 for electric field formation, to which the electromagnetic energy is supplied through the waveguides WG and which are disposed to face a plasma formation space. The plurality of electrodes 461 are arranged along the lengthwise direction A of the waveguides WG so that each of the plurality of electrodes 461 extends in a widthwise direction B of the waveguides WG. |
