SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to stably load substrates without a deflection phenomenon even when the thickness of the substrate is thin and to uniformly process through whole substrates. CONSTITUTION: A substrate processing apparatus comprises a chamber, a susceptor (120), a supporting part (130), and one or more heat source units (200). The chamber comprises a chamber body (102) in which one side is opened and a door (110) which opens and closes a chamber body. The susceptor is equipped inside the chamber in vertical direction. The supporting part is connected to one side of the door and supports a substrate in parallel with the susceptor. One or more of heat source units are arranged on one or more sides of the chamber and heats up the susceptor.