发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 <p>Provided is a photocurable resin composition which contains a carboxyl group-containing resin, a photopolymerization initiator, a naphthalene derivative and/or naphthoquinone, and a derivative thereof, so as to prevent halation and undercutting, obtain stable high resolution, and inhibit the generation of cracks in thermal cycles. Preferably, the naphthalene derivative and/or the naphthoquinone and the derivative thereof are compounds having a hydroxyl group. The photocurable resin composition or a dry film thereof can be suitably used for forming a cured film such as a solder resist which is excellent in terms of various properties such as TCT resistance and PCT resistance for a printed wiring board and a flexible printed wiring board.</p>
申请公布号 KR20130099218(A) 申请公布日期 2013.09.05
申请号 KR20137019864 申请日期 2011.12.19
申请人 TAIYO INK MFG. CO., LTD. 发明人 AKIYAMA MANABU;MINEGISHI SHOJI;ARIMA MASAO
分类号 G03F7/004;C08F2/38;C08L101/08;H05K3/28 主分类号 G03F7/004
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