发明名称 HIGH-DENSITY PIEZOELECTRIC THICK FILM HAVING ALUMINA BUFFER LAYER AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A high density piezoelectric thick film having an alumina buffer layer and a method for manufacturing the same are provided to prevent the Si of a silicon substrate from being diffused into a piezoelectric thick film by using the alumina buffer layer formed between the silicon substrate and the piezoelectric thick film. CONSTITUTION: An alumina buffer layer(20) is formed on a silicon substrate(10). A piezoelectric thick film(30) is formed on the alumina buffer layer. The alumina buffer layer is deposited on the silicon substrate and heat-treated. The alumina buffer layer prevents the Si diffusion of the silicon substrate to the piezoelectric thick film. The piezoelectric thick film is formed by sintering a piezoelectric paste on the alumina buffer layer.
申请公布号 KR101303924(B1) 申请公布日期 2013.09.05
申请号 KR20110125270 申请日期 2011.11.28
申请人 发明人
分类号 C04B35/491;H01L41/16;H01L41/187;H01L41/22 主分类号 C04B35/491
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