发明名称 |
HIGH-DENSITY PIEZOELECTRIC THICK FILM HAVING ALUMINA BUFFER LAYER AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A high density piezoelectric thick film having an alumina buffer layer and a method for manufacturing the same are provided to prevent the Si of a silicon substrate from being diffused into a piezoelectric thick film by using the alumina buffer layer formed between the silicon substrate and the piezoelectric thick film. CONSTITUTION: An alumina buffer layer(20) is formed on a silicon substrate(10). A piezoelectric thick film(30) is formed on the alumina buffer layer. The alumina buffer layer is deposited on the silicon substrate and heat-treated. The alumina buffer layer prevents the Si diffusion of the silicon substrate to the piezoelectric thick film. The piezoelectric thick film is formed by sintering a piezoelectric paste on the alumina buffer layer. |
申请公布号 |
KR101303924(B1) |
申请公布日期 |
2013.09.05 |
申请号 |
KR20110125270 |
申请日期 |
2011.11.28 |
申请人 |
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发明人 |
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分类号 |
C04B35/491;H01L41/16;H01L41/187;H01L41/22 |
主分类号 |
C04B35/491 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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