| 摘要 |
An exposure apparatus includes a light shielding plate that is arranged on a plane conjugate to a substrate plane and shields against light to prevent the light; a first driving unit that rotationally drives the light shielding plate about an axis parallel to an optical axis of the illumination system; a second driving unit that linearly drives the light shielding plate within a plane perpendicular to the optical axis; a detecting unit that detects a light-shielding position; and a control unit that stores a light-shielding position at reference time point and prior to and after change of the light shielding plate, and calculates a variation amount of the light-shielding position based on a light-shielding position detected by the detecting unit at any time point after the light shielding plate is changed, a light-shielding position at the reference time point, and the difference between stored light-shielding positions. |
