| 摘要 |
PROBLEM TO BE SOLVED: To improve line edge roughness (LER) during producing a resist pattern.SOLUTION: A resist composition is provided, which comprises: a resin that is insoluble or hardly soluble with an alkali aqueous solution and can be dissolved in an alkali aqueous solution by an action of an acid; and a salt expressed by formula (I). In formula (I), Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a trivalent aliphatic saturated hydrocarbon group having 1 to 30 carbon atoms, or the like; ring Wand ring Weach independently represent an aliphatic ring having 3 to 36 carbon atoms, or the like; Rand Reach independently represent a hydroxy group or an alkyl group having 1 to 6 carbon atoms; and t1 and t2 each independently represent an integer of 0 to 2. |
