发明名称 |
SEMICONDUCTOR HEATER MANUFACTURING METHOD AND HEATER THEREUSING |
摘要 |
PURPOSE: A method for manufacturing a heater for a semiconductor manufacturing apparatus and the heater manufactured by the same are provided to improve a surface property, thereby improving manufacturing efficiency. CONSTITUTION: The surface of a heater is planarized. The planarized heater surface is heated. A photosensitive film is bonded onto the heated surface of the heater. A printed pattern film is bonded onto the photosensitive film. An ultraviolet ray is irradiated to the photosensitive film. |
申请公布号 |
KR101301507(B1) |
申请公布日期 |
2013.09.04 |
申请号 |
KR20120134908 |
申请日期 |
2012.11.26 |
申请人 |
CM KOREA CO., LTD. |
发明人 |
KANG, SEUNG DONG;CHOI, WON CHEOL |
分类号 |
H01L21/205;H01L21/02;H01L21/324 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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