发明名称 SEMICONDUCTOR HEATER MANUFACTURING METHOD AND HEATER THEREUSING
摘要 PURPOSE: A method for manufacturing a heater for a semiconductor manufacturing apparatus and the heater manufactured by the same are provided to improve a surface property, thereby improving manufacturing efficiency. CONSTITUTION: The surface of a heater is planarized. The planarized heater surface is heated. A photosensitive film is bonded onto the heated surface of the heater. A printed pattern film is bonded onto the photosensitive film. An ultraviolet ray is irradiated to the photosensitive film.
申请公布号 KR101301507(B1) 申请公布日期 2013.09.04
申请号 KR20120134908 申请日期 2012.11.26
申请人 CM KOREA CO., LTD. 发明人 KANG, SEUNG DONG;CHOI, WON CHEOL
分类号 H01L21/205;H01L21/02;H01L21/324 主分类号 H01L21/205
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