发明名称 |
DIFFUSION AGENT COMPOSITION, METHOD OF FORMING AN IMPURITY DIFFUSION LAYER, AND SOLAR CELL |
摘要 |
The disclosed diffusion agent composition is used in the formation of an impurity diffusion agent layer on a semiconductor substrate, and contains (A) an impurity diffusion component, (B) a silicon compound, and (C) a solvent containing (C1) a solvent with a boiling point of 100C or less, (C2) a solvent with a boiling point of 120-180C, and a (C3) solvent with a boiling point of 240-300C. |
申请公布号 |
KR20130098157(A) |
申请公布日期 |
2013.09.04 |
申请号 |
KR20127030239 |
申请日期 |
2011.04.12 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
MUROTA ATSUSHI;HIRAI TAKAAKI |
分类号 |
H01L31/04;H01L21/225;H01L31/18 |
主分类号 |
H01L31/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|