摘要 |
<p>Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.</p> |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SOORIYAKUMARAN, RATNAM;TRUONG, HOA;DIPIETRO, RICHARD, ANTHONY;SWANSON, SALLY, ANN |