发明名称 |
Cu-Mg-P based copper alloy material |
摘要 |
<p>A copper alloy material comprising, by mass%:
Mg of 0.3 to 2%;
P of 0.001 to 0.1%;
optionally, Zr of 0.001 to 0.03 %;
the balance including Cu and inevitable impurities,
wherein an area fraction of such crystal grains that an average misorientation between all pixels in each crystal grain is less tllan 4° is 45 to 55% of a measured area, when orientations of all the pixels in the area of the surface of the copper alloy material are measured in a step of 0.5 µm by an EBSD method with a scanning electron microscope of an electron backscattered diffraction image system and a boundary in which a misorientation between adjacent pixels is 5° or more is considered as a crystal grain boundary,
and wherein a tensile strength is 641 to 708 N/mm 2 , and a bending elastic limit value is 472 to 503 N/mm 2 .</p> |
申请公布号 |
EP2634274(A1) |
申请公布日期 |
2013.09.04 |
申请号 |
EP20130167417 |
申请日期 |
2010.06.09 |
申请人 |
MITSUBISHI SHINDOH CO., LTD. |
发明人 |
SAKURAI, TAKESHI;KAMEYAMA, YOSHIHIRO;ABE, YOSHIO |
分类号 |
C22C9/00;C22F1/08 |
主分类号 |
C22C9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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